Cat No:OCTOX-0013
A 99.9% niobium-doped titanium dioxide sputtering target for transparent conductive oxide films. TNO combines electrical conductivity with high visible-light transmission, is compatible with standard semiconductor processing and can be deposited as films or nanostructures.
| Chemical Composition | Niobium-doped titanium dioxide |
| Molecular Formula | TiO2-Nb |
| Purity/Assay | 99.9% |
| Form | Niobium-doped titanium oxide sputtering target |
| Applications | Transparent conductive oxide films; semiconductor-compatible coatings; near-infrared plasmonic structures; low-loss tunable optical materials; thin films and nanostructures |
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For Research or Industrial Raw Materials, Not For Personal Medical Use!
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