Eata Energy supplies evaporation materials for vacuum thin-film deposition, supporting research laboratories, process-development teams and industrial coating operations. Our portfolio covers oxide, compound, alloy and elemental metal source materials for thermal evaporation, electron-beam evaporation and related physical vapor deposition workflows.
In an evaporation process, the source material is heated until atoms or molecules enter the vapor phase and travel through a vacuum toward the substrate. The vapor then condenses as a thin film. Source selection must therefore consider not only the target film composition, but also vapor pressure, melting or sublimation behavior, compatibility with the boat, crucible or hearth, and the possibility of decomposition or composition shift during heating.
Dielectric, optical, transparent-conductive, barrier and functional oxide film sources.
Fluoride, sulfide, selenide, nitride, boride, carbide and other compound sources.
Pre-alloyed compositions for electrical, magnetic, brazing, optical and functional coatings.
Elemental metals for conductive, reflective, adhesion, electrode and protective layers.
Figure 1. Ceramic source pieces prepared for oxide thin-film deposition.
Oxide evaporation materials are widely used when a film must provide optical control, electrical insulation, surface protection, transparent conductivity or another composition-dependent function. Commonly requested materials include aluminum oxide, hafnium oxide, magnesium oxide, niobium oxide, silicon monoxide, silicon dioxide, tantalum oxide, titanium oxide, tungsten oxide, yttrium oxide, zinc oxide, zirconium oxide and mixed oxides such as indium tin oxide. Depending on the chemistry, deposition may use direct evaporation, reactive evaporation or oxygen-assisted processing to help manage film stoichiometry.
Compound materials extend thin-film design beyond elemental metals and simple oxides. The portfolio may include fluorides for optical layers, sulfides and selenides for optoelectronic structures, nitrides and borides for functional or protective films, and selected carbides or other inorganic compounds. Representative search terms include magnesium fluoride, calcium fluoride, lithium fluoride, zinc sulfide, zinc selenide, silicon nitride, aluminum nitride, boron nitride, titanium nitride, molybdenum sulfide and related compound evaporation sources. Process suitability should be evaluated for each composition because some compounds can dissociate or evaporate non-congruently.
Figure 2. Granular compound feedstock for controlled vacuum evaporation.
Alloy evaporation materials are selected when a defined multi-element film is needed for electrical resistance, magnetic response, soldering or bonding, corrosion control, optical performance or thermal stability. Typical material families include nickel-chromium, iron-chromium-aluminum, aluminum-silicon, gold-tin, silver-copper, copper-nickel, nickel-iron, cobalt-iron, titanium-aluminum and other binary or multicomponent alloys. Because alloying elements can have different vapor pressures, the evaporation route, source temperature and deposition-rate strategy must be matched to the desired film composition.
Elemental metals remain core source materials for conductive traces, electrodes, reflective coatings, adhesion layers, contacts, diffusion-control layers and research films. Frequently used examples include aluminum, silver, gold, chromium, copper, cobalt, iron, hafnium, indium, magnesium, molybdenum, niobium, nickel, palladium, platinum, silicon, tin, tantalum, titanium, tungsten, zinc and zirconium. Lower-melting metals may be suited to resistive thermal evaporation, while refractory metals and many ceramics are commonly processed by electron-beam heating or another high-energy source.
Figure 3. Alloy pellets for composition-specific thin-film processes.
| Category | Representative Materials | Common Forms | Typical Thin-Film Uses |
| Oxides | Al2O3, HfO2, MgO, Nb2O5, SiO, SiO2, Ta2O5, TiO2, WO3, Y2O3, ZnO, ZrO2, ITO | Pellets, granules, pieces, tablets, powder | Optical stacks, dielectric layers, sensors, transparent conductive layers, barrier coatings |
| Compounds | MgF2, CaF2, LiF, AlF3, ZnS, ZnSe, Si3N4, AlN, BN, TiN, MoS2 and related materials | Pellets, granules, pieces, tablets, powder | Optical coatings, optoelectronics, functional layers, protective coatings, research structures |
| Alloys | NiCr, FeCrAl, AlSi, AuSn, AgCu, CuNi, NiFe, CoFe, TiAl and custom compositions | Pellets, granules, pieces, rods, wire | Resistive films, magnetic films, bonding layers, contacts, functional and decorative coatings |
| Metals | Al, Ag, Au, Cr, Cu, Co, Fe, Hf, In, Mg, Mo, Nb, Ni, Pd, Pt, Si, Sn, Ta, Ti, W, Zn, Zr | Pellets, granules, shot, pieces, rods, wire | Electrodes, conductors, reflectors, adhesion layers, contacts, protective and research films |
Evaporation source materials can be prepared in different physical forms to suit the loading geometry, heating method and desired evaporation behavior. Common options include:
When requesting a quotation, providing the material formula or alloy ratio, required purity, preferred form, dimensions, quantity, evaporation method, crucible or boat type, and target film application helps define a more useful specification.
Figure 4. Metal source pieces for conductive and reflective coatings.
A material that matches the nominal film chemistry is only the starting point. Practical source selection should also consider:
For multi-element alloys and compounds, co-evaporation or reactive processing may be more appropriate than direct evaporation when constituent vapor pressures differ substantially. Final process parameters should be confirmed through equipment-specific trials and film characterization.
| Application Area | Typical Film Functions | Relevant Material Families |
| Photovoltaics and Energy Devices | Electrodes, contact layers, transparent conductors, optical-control layers and interface films | Metals, oxides, transparent conductive oxides, selected compounds and alloys |
| Semiconductors and Microelectronics | Metallization, adhesion, barrier, dielectric, contact and research layers | Al, Au, Ag, Cu, Cr, Ti, Ni, Ta, W, SiO2, Al2O3, HfO2 and related materials |
| Optics and Photonics | Reflective, anti-reflective, high-index, low-index, protective and spectral-control coatings | MgF2, SiO2, TiO2, Ta2O5, HfO2, ZnS, Al, Ag, Au and multilayer combinations |
| Sensors and Functional Surfaces | Conductive, catalytic, magnetic, responsive and protective films | Pt, Pd, Ni, Co, Fe, NiFe, CoFe, ZnO, WO3 and other functional chemistries |
| Display and Optoelectronics | Electrodes, optical layers, contact layers and encapsulation-supporting films | ITO, metals, oxides, fluorides, sulfides and selected compounds |
| Industrial Coatings | Wear, corrosion, heat, diffusion and decorative performance | Metals, alloys, oxides, nitrides, borides and selected compound systems |
Figure 5. Vacuum evaporation source during material vaporization.
Not every coating program can be supported by a standard catalog item. Eata Energy can discuss custom evaporation materials based on target composition, purity, particle size, pellet or tablet dimensions, alloy ratio, batch quantity and packaging requirements. We can also evaluate requests for non-standard oxide, compound, alloy and metal source materials intended for specialized thin-film research or industrial deposition.
To start a technical inquiry, share your desired material, deposition method, source geometry and target film application. Our team will review the information and help define an appropriate product specification for quotation.
| Catalog Number | Product Name | Order | Quantity |
|---|---|---|---|
| SEMEM-0001 | Copper (Cu) Evaporation Crucible, 99.99% Purity | Inquiry | |
| SEMEM-0002 | Molybdenum (Mo) Evaporation Crucible, 99.50%-99.99% Purity | Inquiry | |
| SEMEM-0003 | Tungsten (W) Evaporation Crucible, 99.50%-99.99% Purity | Inquiry | |
| SEMEM-0004 | Tantalum (Ta) Evaporation Crucible, 99.50%-99.99% Purity | Inquiry | |
| SEMEM-0005 | Carbon (C) Evaporation Crucible, 99.99% Purity | Inquiry | |
| SEMEM-0006 | Niobium (Nb) Evaporation Crucible, 99.50%-99.99% Purity | Inquiry |
For Research or Industrial Raw Materials, Not For Personal Medical Use!
|
There is no product in your cart. |