Titanium stands alone among structural metals for its extraordinary strength-to-weight ratio, exceptional corrosion resistance across chloride-rich and oxidizing environments, and proven biocompatibility that has made it the material of choice for long-term human implantation. From the compressor blades of jet engines to the dental implants fusing with human jawbone, titanium's ability to form a stable, self-healing oxide layer just nanometers thick grants it a durability that few other metals can match in aggressive service conditions.
Eata Energy supplies high-purity titanium metal spanning grades from 99.7% to 99.995%+ (3N to 4N5+), available as sponge, crystal bar, sputtering targets, foil, wire, rod, powder, and precision-machined custom forms. Each batch is accompanied by comprehensive analytical documentation including ICP-MS trace element analysis, ensuring your research or production process benefits from material consistency you can verify.
Titanium's position in Group 4 of the periodic table underpins its unique blend of properties. The hexagonal close-packed (HCP) alpha phase at room temperature transitions to body-centered cubic (BCC) beta at 882°C, enabling sophisticated heat treatments that manipulate microstructure for tailored mechanical performance.
| Property | Value | Notes |
| Atomic Number | 22 | Group 4, Period 4 |
| Atomic Weight | 47.87 g/mol | |
| Density | 4.51 g/cm³ | ~60% of steel |
| Melting Point | 1668°C | |
| Boiling Point | 3287°C | |
| Crystal Structure | HCP (α) / BCC (β) | Transition at 882°C |
| Young's Modulus | 116 GPa | ~50% of steel |
| Tensile Strength | 240 MPa (Grade 1) | Varies by grade |
| CAS Number | 7440-32-6 | EINECS: 231-142-3 |
| Electronegativity | 1.54 (Pauling) |
Figure 1: Polished high-purity titanium bar with characteristic dark silver-gray metallic luster
Titanium exhibits five naturally occurring isotopes, with ¹Ti (73.8% abundance) being the most prevalent. Unlike many transition metals, titanium's low magnetic susceptibility and excellent corrosion resistance in seawater and chlorine environments derive directly from the thermodynamic stability of its surface TiO₂ layer, which reforms instantaneously when damaged.
Our titanium inventory encompasses the full range of physical forms required by researchers and process engineers, each produced to controlled specifications for reproducible results.
Titanium sponge, produced via the Kroll process, represents the primary feedstock for titanium melting and alloy production. For research requiring the highest purity, electron-beam melted crystal bar offers superior cleanliness with interstitial elements controlled to minimal levels.
HIP-consolidated titanium sputtering targets achieve full density with uniform grain structure, enabling stable DC magnetron sputtering for adhesion layers, diffusion barriers, and functional coatings in semiconductor and research applications.
Figure 2: Large-format titanium sputtering target mounted in a PVD vacuum coating chamber
Wrought titanium products support electrochemical research, corrosion testing, mechanical characterization, and experimental device fabrication across CP (commercially pure) and alloy grades.
Spherical and irregular titanium powders serve additive manufacturing (SLM, EBM), metal injection molding, and powder metallurgy research. Controlled oxygen content and particle size distribution ensure process consistency.
In multilevel interconnect architectures, titanium thin films serve as adhesion promoters between silicon or dielectric substrates and subsequent aluminum or copper metallization, while simultaneously blocking interdiffusion of silicon into overlying metal layers. The formation of TiSi₂ at the silicon interface creates a low-resistance ohmic contact, while the Ti/TiN bilayer stack has been a cornerstone of semiconductor fabrication for over three decades. Our high-purity titanium sputtering targets and evaporation pellets support research into next-generation barrier architectures for sub-3 nm technology nodes.
Figure 3: Schematic of multilayer thin-film stack showing titanium barrier and adhesion layers in a semiconductor device
Titanium's biocompatibility stems from the inert TiO₂ surface layer that prevents ion release and promotes direct bone apposition — a phenomenon termed osseointegration. ASTM F67 (Grades 1-4) and ASTM F136 (Ti-6Al-4V ELI) define the chemical composition and mechanical property thresholds for implant-grade titanium. Our high-purity titanium supports research into next-generation implant alloys, surface modifications for enhanced bioactivity, and patient-specific additively manufactured implant geometries.
Ti-6Al-4V (Grade 5) accounts for approximately 60% of global titanium usage, dominating aerospace applications where its specific strength exceeds that of many steels at less than half the weight. From compressor blades and landing gear components to cryogenic propellant tankage, titanium alloys operate reliably from cryogenic temperatures to 600°C. Our titanium starting materials, with controlled interstitial element levels, provide the foundation for alloy development programs targeting next-generation α+β and β-titanium alloy systems.
Figure 4: Precision-machined titanium biomedical implant components showing matte metallic finish
Titanium's resistance to seawater, wet chlorine, and oxidizing acids makes it the material of choice for heat exchangers, pressure vessels, and piping in chemical processing, desalination, and offshore oil & gas applications. Research into titanium's corrosion mechanisms — including crevice corrosion in hot chloride solutions and hydriding under cathodic protection — relies on well-characterized, high-purity starting material to establish reproducible baseline behavior.
The appropriate titanium purity grade depends on the sensitivity of the application to specific interstitial and metallic impurities. The following matrix provides practical guidance.
| Grade | Characteristics | Recommended For |
| Ti 99.7% | Standard industrial; O < 0.3% | Chemical process equipment, alloy feedstock |
| Ti 99.9% | Improved purity; controlled O, N, H | Aerospace alloy melting, AM powder feedstock |
| Ti 99.99% | 4N; interstitials < 500 ppm | Sputtering targets, semiconductor barriers, research |
| Ti 99.995% | 4N5; EB-melted, GDMS verified | Advanced semiconductor, quantum devices, standards |
Eata Energy applies rigorous analytical protocols to verify every titanium batch before release, with results compiled in a Certificate of Analysis delivered with each shipment.
Figure 5: Titanium sponge chunks in a glass beaker showing porous crystalline metallic texture
Research programs and advanced manufacturing initiatives frequently require titanium configurations beyond standard catalog offerings. Eata Energy's technical team works directly with clients to develop and procure bespoke titanium products.
Contact our materials scientists early in your project planning to align titanium grade, form, and specification with your performance targets and regulatory requirements.
| Catalog Number | Product Name | Order | Quantity |
|---|---|---|---|
| HPMHPTN-0001 | High-Purity Titanium Metal Powder, 90–99.5%, 60–325 Mesh | Inquiry | |
| HPM-HPT-0001 | High-Purity Titanium Straight Wire | Inquiry | |
| HPMHPTN-0002 | Spherical Titanium Powder, ≥99.9%, 5–150 µm | Inquiry | |
| HPM-HPT-0002 | High-Purity Titanium Spool Wire | Inquiry | |
| HPMHPTN-0003 | 99.9% Titanium Sputtering Target (Ti) | Inquiry | |
| HPM-HPT-0003 | High-Purity Titanium Thin-Wall Tube | Inquiry | |
| HPM-HPT-0004 | Ultra-High-Purity Titanium Sputtering Target | Inquiry | |
| HPM-HPT-0005 | Titanium Machining Rod Stock | Inquiry | |
| HPM-HPT-0006 | High-Purity Titanium Powder | Inquiry | |
| HPM-HPT-0007 | Titanium Evaporation Pellets | Inquiry |
For Research or Industrial Raw Materials, Not For Personal Medical Use!
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