99.9% SiO2-Ta Composite Dielectric Sputtering Target

Cat No:OCSO-0062

Description

A composite sputtering target combining silicon dioxide with tantalum, designed for depositing dielectric and barrier thin films. The SiO2 matrix provides excellent electrical insulation and thermal stability, while the tantalum component enhances film density and mechanical durability for advanced semiconductor and optical coating applications.

Datasheet

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Basic Information

Alloy System	SiO2-Ta
Chemical Composition	SiO2-Ta composite
Molecular Formula	SiO2-Ta
Purity/Assay	99.9%
Form	Sputtering target

Applications

Dielectric thin-film coatings; diffusion barrier layers; optical coatings; semiconductor passivation films

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