Cat No:OCZO-0013
Eata Energy supplies high-purity gallium-doped zinc oxide (gzo) ceramic sputtering targets for controlled thin-film deposition. This material is listed with the formula Ga2O3/ZnO and 99.99% purity. Ceramic targets can be paired with a backing plate to support handling and heat transfer during sputtering.
| Product Form | Ceramic Sputtering Target |
| Chemical Formula | Ga2O3/ZnO |
| Purity | 99.99% |
| Key Properties | Purity: 99.99%; brittle ceramic target suitable for backing-plate-supported sputtering. |
| Applications | Thin-film sputtering for microelectronic components, display devices, data-storage media and related coating research. |
Eata Energy delivers high-performance energy materials, application-focused customization, and reliable global supply solutions—empowering innovation across energy storage, photovoltaics, semiconductors, and advanced optoelectronics.
For Research or Industrial Raw Materials, Not For Personal Medical Use!
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