99.99% Gallium-Doped Zinc Oxide Multifunctional Sputtering Target (GZO)

Cat No:OCZO-0004

Description

Eata Energy supplies 99.99% gallium-doped zinc oxide sputtering targets engineered for transparent conductive, piezoelectric and photocatalytic oxide films.

Datasheet

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Basic Information

Product Form	Sputtering target
Chemical Formula	ZnO-Ga2O3
Purity	99.99%
Surface Roughness	<0.3 nm RMS after deposition
Key Properties	Ga3+ site occupancy above 98%; controllable oxygen-vacancy concentration of 10^16-10^20 cm^-3; average visible-light transmittance above 95% at 550 nm; piezoelectric coefficient d33 at least 12 pC/N; resistance change below 3% after 1000 hours at 85°C/85% RH; proton-radiation tolerance above 10^15 p/cm²; flexible-electrode sheet resistance up to 5 Ω/sq; sputter-damage depth below 2 nm; sheet-resistance uniformity within ±1.5% across 6 inches.
Carrier Mobility	>65 cm²/V·s

Applications

Foldable-display transparent electrodes, micro-LED bonding layers, piezo-photocatalytic water-splitting films, perovskite-solar-cell transport layers, radiation-resistant sensors, deep-space transparent antennas, tactile artificial-skin arrays and optical stimulation layers.

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Eata Energy delivers high-performance energy materials, application-focused customization, and reliable global supply solutions—empowering innovation across energy storage, photovoltaics, semiconductors, and advanced optoelectronics.

For Research or Industrial Raw Materials, Not For Personal Medical Use!