99.99% Silicon Dioxide Ceramic Sputtering Target (SiO2), Colorless Transparent, 2.1 g/cm3 product detail at Eata Ray
99.99% Silicon Dioxide Ceramic Sputtering Target (SiO2), Colorless Transparent, 2.1 g/cm3
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99.99% Silicon Dioxide Ceramic Sputtering Target (SiO2), Colorless Transparent, 2.1 g/cm3

Cat No:OCSO-0064

Description

Eata Energy supplies high-purity silicon dioxide ceramic sputtering targets for controlled thin-film deposition. This material is listed with the formula SiO2, 99.99% purity, a colorless transparent appearance and a density of 2.1 g/cm3. Ceramic targets can be paired with a backing plate to support handling and heat transfer during sputtering.

Basic Information

Product Form Ceramic Sputtering Target
Chemical Formula SiO2
Purity 99.99%
Density 2.1 g/cm3
Key Properties Purity: 99.99%; color: Colorless Transparent; density: 2.1 g/cm3; brittle ceramic target suitable for backing-plate-supported sputtering.
Color Colorless Transparent

Applications

Applications Thin-film sputtering for microelectronic components, display devices, data-storage media and related coating research.

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For Research or Industrial Raw Materials, Not For Personal Medical Use!

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