99.99% YbF3 Low-Absorption Rare-Earth Fluoride Sputtering Target product detail at Eata Ray
99.99% YbF3 Low-Absorption Rare-Earth Fluoride Sputtering Target
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99.99% YbF3 Low-Absorption Rare-Earth Fluoride Sputtering Target

Cat No:SVDHM-0013

Description

A rare-earth fluoride target produced through vacuum hot pressing and surface passivation. Its controlled Yb:F ratio, low oxygen level, refined microstructure, low optical absorption, and resistance to hydrolysis support demanding optical-coating processes.

Basic Information

Chemical Composition Ytterbium fluoride
Density (g/cm³) 4.01
Molecular Formula YbF3
Molecular Weight (g/mol) 230.04
Purity/Assay 99.99%
Form Rare-earth fluoride sputtering target
Melting Point (°C) 1157
Density (g/mL or g/cm³) 4.01
Boiling Point (°C) 2200
Solubility Insoluble in water and dilute acids
Deposition Method Thermal evaporation or ion-beam sputtering
Processing Conditions Vacuum hot pressing with surface passivation
Oxygen Content (ppm) <100
Relative Density (%) >=95 of theoretical density
Grain Size (nm) <=500
Stoichiometric Ratio Yb:F = 1:3.00 ±0.02
Optical Absorption Coefficient (cm⁻¹) <1×10^-4 over 400–8000 nm
Moisture Stability (% RH) >90 without hydrolysis

Applications

Applications Infrared antireflection coatings; laser-protection layers; ultraviolet cutoff filters; high-energy laser optics; space optical devices; lithography equipment

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