Gallium-Doped Zinc Oxide GZO Ceramic Sputtering Target

Cat No:OCZO-0002

Description

A gallium-doped zinc oxide ceramic sputtering target, commonly identified as GZO, for transparent conductive and semiconductor oxide films. The material system combines a zinc oxide matrix with gallium oxide doping for thin-film development.

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Basic Information

Chemical Composition	ZnO-Ga2O3
Molecular Formula	ZnO-Ga2O3
Form	Oxide ceramic sputtering target
Material	Gallium-doped zinc oxide ceramic

Applications

Transparent conductive oxide films; oxide-semiconductor layers; optoelectronic coatings; thin-film device research

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