Titanium Dioxide Nanoparticle Pastes and Organotitanate Inks

Cat No:OCTOX-0001

Description

A family of titanium dioxide and organotitanate formulations designed for compact blocking layers, transparent mesoporous scaffolds, active photoelectrodes and reflective light-scattering layers. Grades are available for screen printing, spin coating and slot-die coating in dye-sensitized and perovskite solar-cell research.

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Basic Information

Chemical Composition	Titanium dioxide nanoparticles (anatase), large light-scattering titanium dioxide particles, or organotitanate precursor formulations, depending on grade.
Fabrication Properties	Formulation-dependent control of porosity, transparency, surface area, light scattering and compactness. Compatible with multiple scalable coating methods.
Form	Paste or coating ink
Particle Size	15–20 nm anatase particles for active layers; >100 nm diffusing particles for reflective grades.
Thickness	Typical fired layers: 50–100 nm, 500 nm or 600 nm, depending on formulation and coating method.
Concentration (wt.%)	Approximately 1.4–18, depending on formulation.
Product Variants	Transparent active screen-printing paste: 15–20 nm anatase, ~18 wt.%; reflective screen-printing paste: >100 nm diffusing particles, ~18 wt.%; diffusing active screen-printing paste: 15–20 nm anatase plus >100 nm diffusing particles, ~18 wt.%; compact blocking screen-printing formulation: organotitanate, ~2.6 wt.%; compact blocking screen-printing formulation for monolithic devices: organotitanate, ~3.9 wt.%; transparent scaffold screen-printing paste: 15–20 nm anatase, ~9 wt.%; compact blocking spin-coating formulation: organotitanate, ~6.0 wt.%; transparent scaffold spin-coating formulation: 15–20 nm anatase, ~7.0 wt.%; compact blocking slot-die formulation: organotitanate, ~3.6 wt.%; transparent scaffold slot-die formulation: 15–20 nm anatase, ~1.4 wt.%
Deposition Method	Screen printing; spin coating; slot-die coating.
Vehicle / Solvent	Terpineol, glycols, alcohols, water, aromatic solvents, surfactants and organic binders, formulation-dependent.
Processing Conditions	Representative conditions include firing at 475–500 °C for 30–60 min. Screen-printing and slot-die grades commonly use 500 °C for 45 min; spin-coated compact layers use 500 °C for 60 min.
Resulting Layer	Transparent mesoporous, opaque light-diffusing, reflective, or compact transparent titanium dioxide layer, depending on grade.

Applications

Dye-sensitized solar-cell photoanodes; perovskite solar-cell electron-selective layers; mesoporous scaffolds; compact blocking layers; reflective add-on layers; printed photovoltaic research.

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For Research or Industrial Raw Materials, Not For Personal Medical Use!